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The effect of the deposition rate on the structural and morphological properties of TiN and ZrN single layers and TiN/ZrN multilayers deposited by radiofrequency reactive magnetron sputtering has been studied. The total pressure was kept constant and the growth rate variation was obtained by small difference of nitrogen concentration in the fed gas. The decreasing deposition rate results in a structural change in the thin films from (111) orientation to (100) one. As consequence the surface morphology becomes smoother. Films roughness is strongly related with texture and it decreases with an increase in the (100) X-ray diffraction line intensity. In order to achieve a clear interpretation of our experimental results, the ratio between the N+ ions of the plasma and the atoms number reaching the substrate was considered. At high deposition rate with respect to the N+ concentration, the chemical potential of transition …
Publication date: 
13 Jun 2007

A Rizzo, MA Signore, MF De Riccardis, L Capodieci, D Dimaio, T Nocco

Biblio References: 
Volume: 515 Issue: 17 Pages: 6665-6671
Thin Solid Films