Zirconium oxynitride films were deposited by RF reactive magnetron sputtering in water vapor–nitrogen atmosphere varying the deposition temperature from RT to 600° C. The influence of the substrate temperature on the films physical properties was investigated. The obtained films quality was evaluated using optical analysis, X-ray diffraction, X-photoelectron spectroscopy, and Secondary Ion mass spectroscopy. It was found that the variation of the substrate temperature from RT to 600° C caused the transition from cubic …