-A A +A
We propose a new technique for the localization of colloidal nanocrystals (NCs) by directly exposing a polymer/NCs blend to a lithographic process. Our approach relies on the dispersion of CdSe/ZnS core/shell NCs into a layer of photo‐ or electro‐sensitive resist, which is subsequently patterned by means of photolithography or electron beam lithography (EBL), respectively. We have characterized the behaviour of both positive (polymethil‐methacrylate, PMMA) and negative (SU‐8 epoxy resin) resists as polymeric hosts for colloidal nanoemitters. The morphological and optical analysis of the processed samples showed the successful localization of the colloidal NCs. This technique enables the fabrication of two or three dimensional active photonic crystals devices or distributed feed‐back lasers based on colloidal nanocrystal emitters with sub‐micron resolution, without recurring to etching processes. Moreover …
Publication date: 
1 Dec 2006

L Martiradonna, T Stomeo, L Carbone, G Morello, A Salhi, M De Giorgi, R Cingolani, M De Vittorio

Biblio References: 
Volume: 243 Issue: 15 Pages: 3972-3975
physica status solidi (b)